| Identification | More | [Name]
DIETHYLSILANE | [CAS]
542-91-6 | [Synonyms]
DIETHYLSILANE
Diethylsilanealso high purity
(C2H5)2SiH2
diethyl-silan
Silane, diethyl-
Diethylsilane,98+%
Diethylsilane,97%
Diethylsilane,highpuritymin99% | [EINECS(EC#)]
208-834-9 | [Molecular Formula]
C4H12Si | [MDL Number]
MFCD00039877 | [Molecular Weight]
88.22 | [MOL File]
542-91-6.mol |
| Chemical Properties | Back Directory | [Melting point ]
-132°C | [Boiling point ]
56 °C (lit.) | [density ]
0.681 g/mL at 25 °C(lit.)
| [refractive index ]
n20/D 1.391(lit.)
| [Fp ]
−20 °F
| [storage temp. ]
under inert gas (nitrogen or Argon) at 2-8°C | [solubility ]
Miscible with terahydrofuran, diethyl ether, 1,4-dioxane and benzene. | [form ]
liquid | [Specific Gravity]
0.683 | [Hydrolytic Sensitivity]
3: reacts with aqueous base | [Sensitive ]
Air Sensitive | [Merck ]
14,3128 | [BRN ]
1730902 | [CAS DataBase Reference]
542-91-6(CAS DataBase Reference) | [EPA Substance Registry System]
Silane, diethyl- (542-91-6) |
| Safety Data | Back Directory | [Hazard Codes ]
F | [Risk Statements ]
R11:Highly Flammable. | [Safety Statements ]
S16:Keep away from sources of ignition-No smoking .
S23:Do not breathe gas/fumes/vapor/spray (appropriate wording to be specified by the manufacturer) .
S24/25:Avoid contact with skin and eyes . | [RIDADR ]
UN 1993 3/PG 2
| [WGK Germany ]
1
| [TSCA ]
Yes | [HazardClass ]
3 | [PackingGroup ]
II |
| Questions And Answer | Back Directory | [Description]
Diethylsilane is a reagent used in the chemical vapor deposition of SiO2 for microelectronics. It is also used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It can also be used as a reductant in catalytic reduction of secondary amides to imines and secondary amines has been achieved using readily available iridium catalysts such as [Ir(COE)2Cl]2. This system requires low catalyst loading and shows high efficiency and an appreciable level of functional group tolerance. As a reduction agent, it also be used to convert polycarboxylic acids into their corresponding alkanes.
| [Sources]
Levy, R. A., J. M. Grow, and G. S. Chakravarthy. "Low-pressure chemical vapor deposition of silicon dioxide using diethylsilane." Cheminform 24.28(1993):851-854.
https://www.alfa.com/en/catalog/L16468/
https://www.sigmaaldrich.com/catalog/product/aldrich/423815?lang=en®ion=US
https://pubs.acs.org/doi/full/10.1021/ja304547s#citing
Nimmagadda, Rama D., and C. Mcrae. Cheminform 37.35(2006):3505-3508.
|
| Hazard Information | Back Directory | [Uses]
Diethylsilane is used as a precursor to prepare (3-allylsulfanyl-propyl)-diethyl-silane by using (Ph3P)3RhCl as reagent. It is also used in the chemical vapor deposition of SiO2 for microelectronics. | [Application]
Used in the ‘in-situ’ preparation of diborane and haloboranes. |
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