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ChemicalBook--->CAS DataBase List--->2172-02-3

2172-02-3

2172-02-3 Structure

2172-02-3 Structure
IdentificationMore
[Name]

HAFNIUM TERT-BUTOXIDE
[CAS]

2172-02-3
[Synonyms]

HAFNIUM (IV) T-BUTOXIDE
HAFNIUM T-BUTOXIDE
HAFNIUM TERT-BUTOXIDE
HAFNIUM TETRA-T-BUTOXIDE
Hafnium(IV) t-butoxide (99.9%-Hf)
Hafnium(IV) tert-butoxide
Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%
[Molecular Formula]

C16H36HfO4
[MDL Number]

MFCD00070458
[Molecular Weight]

470.94
[MOL File]

2172-02-3.mol
Chemical PropertiesBack Directory
[Melting point ]

2℃
[Boiling point ]

90 °C5 mm Hg(lit.)
[density ]

1.166 g/mL at 25 °C(lit.)
[refractive index ]

n20/D 1.424(lit.)
[Fp ]

83 °F
[solubility ]

Soluble in hydrocarbons, reacts with alcohols, ketones, and esters
[form ]

Liquid
[Specific Gravity]

1.166
[Hydrolytic Sensitivity]

7: reacts slowly with moisture/water
[Sensitive ]

Moisture Sensitive/Light Sensitive
[Exposure limits]

ACGIH: TWA 0.5 mg/m3
NIOSH: IDLH 50 mg/m3; TWA 0.5 mg/m3
[CAS DataBase Reference]

2172-02-3(CAS DataBase Reference)
Safety DataBack Directory
[Hazard Codes ]

Xi
[Risk Statements ]

R10:Flammable.
[Safety Statements ]

S16:Keep away from sources of ignition-No smoking .
[RIDADR ]

UN 1993 3/PG 3
[WGK Germany ]

3
[TSCA ]

No
[HazardClass ]

3
[PackingGroup ]

II
[HS Code ]

2905190019
Hazard InformationBack Directory
[Uses]

Hafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.
[General Description]

Atomic number of base material: 72 Hafnium
[reaction suitability]

core: hafnium
Well-known Reagent Company Product InformationBack Directory
[Alfa Aesar]

Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%(2172-02-3)
[Sigma Aldrich]

2172-02-3(sigmaaldrich)
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