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ChemicalBook >> CAS DataBase List >> TUNGSTEN SILICIDE

TUNGSTEN SILICIDE

TUNGSTEN SILICIDE price.
  • $38 - $94.65
  • Product name: TUNGSTEN SILICIDE
  • CAS: 12039-88-2
  • MF: Si2W
  • MW: 240.01
  • EINECS:234-909-0
  • MDL Number:MFCD00049704
  • Synonyms:TUNGSTEN SILICIDE;TUNGSTEN DISILICIDE;TUNGSTEN SILICIDE, -325 MESH;TUNGSTEN SILICIDE (99.7%-W);TUNGSTEN SILICIDE, 99.995% (METALS BASIS EXCLUDING MO), MO <;Tungsten silicide, 99.995% (metals basis excluding Mo), Mo <20ppm;Tungsten silicide, 99.5% (metals basis);TUNGSTEN SILICIDE, 99%TUNGSTEN SILICIDE, 99%TUNGSTEN SILICIDE, 99%
2 prices
Selected condition:
Brand
  • Alfa Aesar
Package
  • 10g
  • 50g
  • ManufacturerAlfa Aesar
  • Product number011551
  • Product descriptionTungsten silicide 99.5% (metals basis)
  • Packaging10g
  • Price$38
  • Updated2023-06-20
  • Buy
  • ManufacturerAlfa Aesar
  • Product number011551
  • Product descriptionTungsten silicide 99.5% (metals basis)
  • Packaging50g
  • Price$94.65
  • Updated2024-03-01
  • Buy
Manufacturer Product number Product description Packaging Price Updated Buy
Alfa Aesar 011551 Tungsten silicide 99.5% (metals basis) 10g $38 2023-06-20 Buy
Alfa Aesar 011551 Tungsten silicide 99.5% (metals basis) 50g $94.65 2024-03-01 Buy

Properties

Melting point :2165°C
Density :9,88 g/cm3
solubility :insoluble in H2O
form :Powder
Specific Gravity :9.88
color :blue-gray tetragonal crystals, crystalline
Resistivity :33.4 (ρ/μΩ.cm)
Water Solubility :Insoluble in water.
Hydrolytic Sensitivity :2: reacts with aqueous acid
Crystal Structure :Tetragonal
Exposure limits :ACGIH: TWA 3 mg/m3
NIOSH: TWA 5 mg/m3; STEL 10 mg/m3 CAS DataBase Reference :12039-88-2
EPA Substance Registry System :Tungsten silicide (WSi2) (12039-88-2)

Safety Information

Symbol(GHS):
Signal word:
Hazard statements:
Code Hazard statements Hazard class Category Signal word Pictogram P-Codes
Precautionary statements:

Description

Tungsten silicide is used in microelectronics as a contact material. It is also used as a shunt over polysilicon lines to increase their conductivity and increase signal speed. Further, it acts as a barrier layer between silicon and other metals. In addition to this, it is used in microelectro mechanical systems and for oxidation-resistant coatings. It is also employed as a replacement for earlier tungsten films.

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