Dinatrium-4,4'-(1,10-phenanthrolin-4,7-diyl)bis(benzolsulfonat) Chemische Eigenschaften,Einsatz,Produktion Methoden

R-S?tze Betriebsanweisung:

R36/38:Reizt die Augen und die Haut.
R36/37/38:Reizt die Augen, die Atmungsorgane und die Haut.

S-S?tze Betriebsanweisung:

S26:Bei Berührung mit den Augen sofort gründlich mit Wasser abspülen und Arzt konsultieren.
S36:DE: Bei der Arbeit geeignete Schutzkleidung tragen.
S24/25:Berührung mit den Augen und der Haut vermeiden.
S37/39:Bei der Arbeit geeignete Schutzhandschuhe und Schutzbrille/Gesichtsschutz tragen.

Verwenden

Used for pretreatment of planar silicon devices when plating with Nickel plating solution products 44069 and 44070.

Allgemeine Beschreibung

Improved HF Buffer System with stabilized HF activity - selective solvent for SiO2 used in semiconductor technology of planar passivated devices - transistors, integrated circuits, diodes, rectifiers, SCR, MOS, FET

Advantages:

• Ready-to-use - Economical
• HF activity buffer stabilized
• Excellent process reproducibility
• Does not undercut masked oxide
• Will not stain diffused silicon surfaces
• Avoids contamination on silicon surfaces
• Photoresist coating unaffected

Buffer HF improved is an idealized buffer preparation characterized by a high buffer index and an optimized, uniform oxide-etch rate. The composition of buffer HF improved is precisely controlled by HF activity measurements and electrometric pH. The mass balance corresponds essentially to (HF) + (F) + 2(HF₂) for a two-ligand mononuclear complex and the charge balance is (H⁺) - (F) + (HF^2- ). The HF activity is maintained constant through the specific equilibrium constant which regulates the equilibrium reaction between fluoride, bifluoride, and HF buffer components. A second equilibrium constant participates in the regulation of the hydronium in concentration of pH.

Buffer HF improved is produced and analyzed to be essentially free of impurities. Nitrate ions, a common impurity causing stains on diffused silicon surfaces, are specifically removed. Heavy metal impurities, which can lead to degradation of device characteristics, are rigidly controlled under manufacturing process specifications.

Dinatrium-4,4'-(1,10-phenanthrolin-4,7-diyl)bis(benzolsulfonat) Upstream-Materialien And Downstream Produkte

Upstream-Materialien

Downstream Produkte

Dinatrium-4,4'-(1,10-phenanthrolin-4,7-diyl)bis(benzolsulfonat) Anbieter Lieferant Produzent Hersteller Vertrieb H?ndler.

Firmenname	Telefon	E-Mail	Land	Produktkatalog	Edge Rate
Shenzhen Nexconn Pharmatechs Ltd	+86-755-89396905 +86-15013857715	admin@nexconn.com	China	10311	58
Accela ChemBio Inc.	+1-858-6993322	info@accelachem.com	United States	18478	58
Shenyang Simchoice Chemical Co.,Ltd	+86-024-23769576 +86-15040101888	sales@simchoicechem.com	China	254	58
Career Henan Chemica Co	+86-0371-86658258 +8613203830695	laboratory@coreychem.com	China	30233	58
ANHUI WITOP BIOTECH CO., LTD	+8615255079626	eric@witopchemical.com	China	23541	58
Dideu Industries Group Limited	+86-29-89586680 +86-15129568250	1026@dideu.com	China	22787	58
Nanjing Duly Biotech Co.,Ltd	+undefined18013301590	melody@njduly.com	China	2450	58
SUZHOU SENFEIDA CHEMICAL CO.,LTD	+86-0512-83500002 +8615195660023	sales@senfeida.com	China	23046	58
Shanghai Acmec Biochemical Technology Co., Ltd.	+86-18621343501; +undefined18621343501	product@acmec-e.com	China	33338	58
Jilin Chinese Academy of Sciences-yanshen Technology	+undefined18143011203	info@chemextension.com	China	42056	58

53744-42-6(Dinatrium-4,4'-(1,10-phenanthrolin-4,7-diyl)bis(benzolsulfonat))Verwandte Suche:

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• 1,10-Phenanthroline,4,7-di(phenylsulfonicacid)-,disodiumsalt
• 4,4’-(1,10-phenanthroline-4,7-diyl)bis-benzenesulfonicacidisodiumsalt
• 4,7-di(4-Phenylsulfonicacid)-1,10-phenanthroline,disodiumsalt
• Benzenesulfonicacid,4,4’-(1,10-phenanthroline-4,7-diyl)bis-,disodiumsalt
• BATHOPHENANTHROLINEDISULFONIC ACID, DISODIUM SALT HYDRATE
• BATHOPHENANTHROLINE DISULFONIC ACID NA2-SALT H20
• SODIUM PHOSPHATE DIBASIC-SODIUM HYDROXIDE BUFFER
• TE BUFFER SOLUTION, PH 8.0
• RED HIGH-ACCURACY BUFFER SOLUTION, PH 4.000
• REFERENCE BUFFER SOLUTION
• PHOSPHATE-CHLORINE BUFFER
• PHOSPHATE BUFFER, PH 5.8
• PHOSPHATE BUFF, PH 7.2
• PH 11.00 BUFFER
• POTASSIUM PHOSPHATE MONOBASIC - SODIUM PHOSPHATE DIBASIC BUFFER
• POTASSIUM CHLORIDE-HYDROCHLORIC ACID BUFFER
• POTASSIUM CARBONATE-POTASSIUM BORATE-POTASSIUM HYDROXIDE BUFFER
• POTASSIUM ACID PHTHALATE-HYDROCHLORIC ACID BUFFER
• POTASSIUM ACID PHTHALATE - SODIUM HYDROXIDE BUFFER
• BUFFER SOLUTION PH 6.79
• BUFFER SOLUTION PH 6.86
• BUFFER SOLUTION PH 6.865
• BUFFER SOLUTION PH 6.88
• BUFFER SOLUTION PH 6.00
• BUFFER SOLUTION PH 5.00
• BUFFER SOLUTION, PH 5.00, +0.02
• BUFFER SOLUTION, PH 5.0
• BUFFER SOLUTION PH 7.413
• BUFFER SOLUTION, PH 7.2, PHOSPHATE
• BUFFER SOLUTION PH 7.70
• BUFFER SOLUTION PH 8.00
• BUFFER SOLUTION, PH 9.0
• BUFFER SOLUTION PH 9.00 BLUE
• BUFFER SOLUTION PH 9.180
• BUFFER SOLUTION PH 9.22
• BUFFER SOLUTION PH 9.23
• BUFFER SOLUTION PH 9.00
• BUFFER SOLUTION, PH 8.0
• BUFFER SOLUTION PH 8.90
• BUFFER SOLUTION, PH 9.54
• BUFFER SOLUTION, TISAB
• BUFFER TNE 10X SOLUTION
• BUFFER TABLETS, PH 6.4
• BUFFER TABLETS, PH 6.8
• BUFFER TABLETS, PH 7.2
• BUFFER TRIS, ACN AND EDTA SOLUTION
• BUFFER TRIS ACN, EDTA, NACL SOLUTION
• BUFFER SOLUTION A
• BUFFER RINSE SOLUTION
• BUFFER, SODIUM PHOSPHATE, PH 7.0
• BUFFER SODIUM PHOSPHATE, PH 7.4
• BUFFER PHOSPHATE, PH 7.40
• BUFFER POTASSIUM PHOSPHATE
• BUFFER SOLUTION PH 10.00
• BUFFER SOLUTION B
• BUFFER SOLUTION 'B'
• BUFFER SOLUTION PH 1.00
• BUFFER SOLUTION PH 10.012