Dibismuttriselenid
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Dibismuttriselenid Eigenschaften
- Schmelzpunkt:
- 710°C
- Siedepunkt:
- 1007 °C
- Dichte
- 6.82 g/mL at 25 °C(lit.)
- L?slichkeit
- insoluble in H2O
- Aggregatzustand
- Pieces
- Wichte
- 6.82
- Farbe
- Gray
- Wasserl?slichkeit
- Insoluble in water. Decomposes when heated in air. Decomposes in nitric acid and aqua regiaSoluble in strong acids. Insoluble in water and organic solvents.
- Crystal Structure
- Cubic, Halite Structure - Space Group Fm3m
- Merck
- 14,1278
- Expositionsgrenzwerte
- ACGIH: TWA 0.2 mg/m3
NIOSH: IDLH 1 mg/m3; TWA 0.2 mg/m3
- CAS Datenbank
- 12068-69-8(CAS DataBase Reference)
- EPA chemische Informationen
- Bismuth selenide (Bi2Se3) (12068-69-8)
Sicherheit
- Risiko- und Sicherheitserkl?rung
- Gefahreninformationscode (GHS)
Kennzeichnung gef?hrlicher | T,N | ||
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R-S?tze: | 23/25-33-50/53 | ||
S-S?tze: | 20/21-28-45-60-61 | ||
RIDADR | UN 3283 6.1/PG 3 | ||
WGK Germany | 3 | ||
TSCA | Yes | ||
HazardClass | 6.1 |
Bildanzeige (GHS) | ||||||||||||||||||||||
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Alarmwort | Achtung | |||||||||||||||||||||
Gefahrenhinweise |
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Sicherheit |
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Dibismuttriselenid Chemische Eigenschaften,Einsatz,Produktion Methoden
R-S?tze Betriebsanweisung:
R23/25:Giftig beim Einatmen und Verschlucken.R33:Gefahr kumulativer Wirkungen.
R50/53:Sehr giftig für Wasserorganismen, kann in Gew?ssern l?ngerfristig sch?dliche Wirkungen haben.
S-S?tze Betriebsanweisung:
S20/21:Bei der Arbeit nicht essen, trinken,rauchen.S28:Bei Berührung mit der Haut sofort abwaschen mit viel . . . (vom Hersteller anzugeben).
S45:Bei Unfall oder Unwohlsein sofort Arzt zuziehen (wenn m?glich, dieses Etikett vorzeigen).
S60:Dieses Produkt und sein Beh?lter sind als gef?hrlicher Abfall zu entsorgen.
S61:Freisetzung in die Umwelt vermeiden. Besondere Anweisungen einholen/Sicherheitsdatenblatt zu Rate ziehen.
Chemische Eigenschaften
black crystal(s), 1–6mm pieces (fused) of 99.999% purity; rhomb and hexagonal; decomposes when heated in air, by conc HNO3 and by aqua regia; used in semiconductors and in the form of a 99 or 99.999% pure material used as a sputtering target to produce multilayer thin films and magneto?resistant films [HAW93] [MER06] [CER91]Allgemeine Beschreibung
This product has been enhanced for energy efficiency.Dibismuttriselenid Upstream-Materialien And Downstream Produkte
Upstream-Materialien
Downstream Produkte
Dibismuttriselenid Anbieter Lieferant Produzent Hersteller Vertrieb H?ndler.
Global( 101)Lieferanten
Firmenname | Telefon | Land | Produktkatalog | Edge Rate | |
---|---|---|---|---|---|
career henan chemical co | +86-0371-86658258 +8613203830695 |
sales@coreychem.com | China | 29879 | 58 |
Hubei Jusheng Technology Co.,Ltd. | 18871490254 |
linda@hubeijusheng.com | CHINA | 28172 | 58 |
Chongqing Chemdad Co., Ltd | +86-023-6139-8061 +86-86-13650506873 |
sales@chemdad.com | China | 39894 | 58 |
Antai Fine Chemical Technology Co.,Limited | 18503026267 |
info@antaichem.com | CHINA | 9636 | 58 |
HANGZHOU CLAP TECHNOLOGY CO.,LTD | 86-571-88216897,88216896 13588875226 |
sales@hzclap.com | CHINA | 6312 | 58 |
Henan Alfa Chemical Co., Ltd | |
China | 12005 | 58 | |
changzhou huayang technology co., ltd | +8615250961469 |
2571773637@qq.com | China | 9725 | 58 |
Alfa Chemistry | |
Info@alfa-chemistry.com | United States | 24072 | 58 |
ZHEJIANG JIUZHOU CHEM CO., LTD | +86-0576225566889 +86-13454675544 |
admin@jiuzhou-chem.com;jamie@jiuzhou-chem.com;alice@jiuzhou-chem.com | China | 12272 | 58 |
LEAPCHEM CO., LTD. | +86-852-30606658 |
market18@leapchem.com | China | 43340 | 58 |
12068-69-8(Dibismuttriselenid)Verwandte Suche:
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Dikupferselenid
- bismuthselenide(bi2se3)
- BISMUTH SELENIDE
- BISMUTH(III) SELENIDE
- vacuumdepositiongrade,99.999%(metalsbasis)
- bismuth(iii) selenide, vacuum deposition grade
- Bismuth(III) selenide, Vacuum Deposition Grade, 99.999% (metals basis)
- 2,4,5-Triselena-1,3-dibismabicyclo[1.1.1]pentane
- dibismuth triselenide
- Bismuth sesquiselenide
- Bismuth selenide granular (melted), 99.999% trace metals basis
- Bismuth(III) selenide (Bi2Se3)
- Bismuth(III) selenide, 99.999% trace metals basis
- Bismuth(III) selenide lump
- Bismuth selenide BiSe3
- BISMUTH SELENIDE ISO 9001:2015 REACH
- Dibismuttriselenid
- Tantalum Sulfide (TaS2) Sputtering Targets
- Bismuth selenide doped with iron, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Fe)
- Bismuth selenide doped with copper, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cu)
- Bismuth selenide, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95%
- Bismuth selenide doped with manganese, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Mn)
- Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Co)
- Bismuth selenide doped with chromium, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Cr)
- Bismuth selenide doped with nickel, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Ni)
- Bismuth selenide doped with iron, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Fe)
- Bismuth selenide doped with manganese, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Mn)
- Bismuth selenide doped with nickel, sputtering target, diam. × thickness 3 inch × 3 mm, 99.95% (5 wt% Ni)
- Bismuth selenide, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95%
- Bismuth selenide doped with chromium, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cr)
- Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Co)
- Bismuth selenide doped with copper, sputtering target, diam. × thickness 1 inch × 3 mm, 99.95% (5 wt% Cu)
- Bismuth(III) selenide, - 350 mesh, 99.99%
- Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 3 inch × 3 mm (5 wt% Co)
- Bismuth(III) selenide, - 350 mesh
- Bismuth selenide doped with copper, sputtering target, diam. × thickness 1 inch × 3 mm (5 wt% Cu)
- Bismuth selenide doped with copper, sputtering target, diam. × thickness 3 inch × 3 mm (5 wt% Cu)
- Bismuth selenide doped with iron, sputtering target, diam. × thickness 1 inch × 3 mm (5 wt% Fe)
- Bismuth selenide doped with iron, sputtering target, diam. × thickness 3 inch × 3 mm (5 wt% Fe)
- Bismuth selenide doped with manganese, sputtering target, diam. × thickness 1 inch × 3 mm (5 wt% Mn)
- Bismuth selenide doped with manganese, sputtering target, diam. × thickness 3 inch × 3 mm (5 wt% Mn)
- Bismuth selenide doped with nickel, sputtering target, diam. × thickness 1 inch × 3 mm (5 wt% Ni)
- Bismuth selenide doped with nickel, sputtering target, diam. × thickness 3 inch × 3 mm (5 wt% Ni)
- Bismuth selenide, sputtering target, diam. × thickness 1 inch × 3 mm
- Bismuth selenide, sputtering target, diam. × thickness 3 inch × 3 mm
- Bismuth selenide doped with chromium, sputtering target, diam. × thickness 1 inch × 3 mm (5 wt% Cr)
- Bismuth selenide doped with chromium, sputtering target, diam. × thickness 3 inch × 3 mm (5 wt% Cr)
- Bismuth selenide doped with cobalt, sputtering target, diam. × thickness 1 inch × 3 mm (5 wt% Co)
- 12068-69-8
- 2068-69-8
- Chalcogenides
- Materials Science
- Metal and Ceramic Science