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ChemicalBook--->CAS DataBase List--->12039-83-7

12039-83-7

12039-83-7 Structure

12039-83-7 Structure
IdentificationBack Directory
[Name]

TITANIUM SILICIDE
[CAS]

12039-83-7
[Synonyms]

TITANIUM SILICIDE
Titanium disilicde
Titanium disilicon
TITANIUM DISILICIDE
Titanium silicSIT8042.0
titaniumsilicide(tisi2)
Titaniumsilicide(99+%-Ti)
TITANIUM SILICIDE, POWDER
TITANIUM SILICIDE -325 MESH
Ti3C2Tx (MXene) several layer
TITANIUM SILICIDE, 95%, powder
Titanium disilicide powder (TiSi2)
TITANIUM SILICIDE: 99.5%, -45 MICRON
TITANIUM SILICIDE ISO 9001:2015 REACH
Titaniumsilicidemicronpowderblackpowder
Titanium silicide, 99.5% (metals basis)
bis(λ2-silanylidene)titanium
Titanium disilicide nanopowder, APS 20-30nm
Titanium silicide, 99.5% trace metals basis
Titanium silicide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick
Titanium silicide sputtering target, 76.2mm (3.0 in.) dia. x 3.18mm (0.125 in.) thick
Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi
Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi
Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi
Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi
Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
[EINECS(EC#)]

234-904-3
[Molecular Formula]

Si2Ti
[MDL Number]

MFCD00151541
[MOL File]

12039-83-7.mol
[Molecular Weight]

104.04
Chemical PropertiesBack Directory
[Melting point ]

1540°C
[Boiling point ]

1540°C
[density ]

4,39 g/cm3
[RTECS ]

XR2420000
[solubility ]

insoluble in H2O, acid solutions, alkaline solutions; soluble in HF
[form ]

Powder
[color ]

Gray
[Resistivity]

123 (ρ/μΩ.cm)
[Water Solubility ]

Soluble in hydrofluoric acid. Insoluble in water.
[Crystal Structure]

Orthorhombic
[EPA Substance Registry System]

Titanium silicide (TiSi2) (12039-83-7)
Hazard InformationBack Directory
[Chemical Properties]

orthorhombic black powder(s), a=0.8236 nm, b=0.4773nm, c=0.8523 nm; hardness 4.5 Mohs; resistivity 123μοhm· cm can be prepared by reaction of the elements; used in special alloy applications, as a flame-resistant coating material, also as 99.5 or 99.9% pure material, as a sputtering target in the fabrication of integrated circuits [HAW93] [STR93] [CER91]
[Uses]

In special alloy applications, as a flame or blast impingement-resistant coating material.
[Synthesis]

(1) PREPARATION FROM THE ELEMENTS
Ti + 2 Si = TiSi2
The silicides are prepared by fusing or sintering intimate stoichiometric mixtures of the elements (in powder form). The reaction is carried out in sintered clay or ceramic crucibles, placed in a Tammann furnace under a blanket of Ar. In all three cases the reaction takes place at a relatively low temperature and is highly exothermic; therefore, one should work with gram quantities only.
(2) ALUMINOTHERMIC METHOD
Ignition of a mixture of, for example, 200 g. of Al powder, 250 g. of S, 180 g. of SiOa and 15 g. of TiO2 (or 40 g. of K2TiF6 ), covered with a thin layer of Mg, yields an ingot containing, in addition to Si and Al, small, iron-gray tetragonal pyramids of TiSi2 .
(3) ELECTROLYTIC PREPARATION
The pure, crystalline silicides ar e obtained by melt electrolysis of a mixture of, for example, 10K2SiF6 + TiO2 at about 900°C, using an iron cathode; alternately, electrolysis of TiO2 dissolved in a melt of silicate may be used.
Safety DataBack Directory
[RIDADR ]

UN3178
[TSCA ]

Yes
[HazardClass ]

4.1
[PackingGroup ]

III
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