Bis(2-ethylhexyl) sebacate synthesis
- Product Name:Bis(2-ethylhexyl) sebacate
- CAS Number:122-62-3
- Molecular formula:C26H50O4
- Molecular Weight:426.67
Yield:122-62-3 97.23%
Reaction Conditions:
with titanium(IV) isopropylate at 150 - 215; for 3.5 h;Large scale;Reagent/catalyst;Temperature;
Steps:
2 The preparation method of a cold-resistant plasticizer dioctyl sebacate according to the present embodiment comprises the following steps
2940 kg of 2-ethylhexanol and 1200 kg of sebacic acid were charged into a 6 m3esterification kettleat a mass ratio of 2.45: 1.0, the temperaturewas raised to 150 ° C while stirring, 5.0 kg of tetraisopropyl titanate was added, To 215 ° C, after 3.5 hours of reaction, and the acid value of the reaction product was found to be 0.185 mgKOH / g.After the esterification reaction was completed, the reaction was carried out at 190 ° C for 1 hour at normal pressure, the excess alcohol was removed to 1200 kg, and the alcohol was dehydrated for 30 minutes at a vacuum of -0.085 to -0.075 MPa for 30 minutes, 162 kg of the partial ester substance, and the acid value of the detection product was 0.181 mgKOH / g.The reaction product of Step 2 was cooled to 100 ° C, 180 kg of 3% NaOH aqueous solution was added, the stirring was continued for 25 minutes, and the solution was allowed to stand for 30 minutes.Step three will be transferred to the product obtained 5m3stills, the temperature was raised to 265 , slowly introduced into the vacuum, vacuum degree of control -0.095 ~ -0.085MPa, begin the distillation process; collect the distillate in the pressure filtration vessel.In the filter press, adjust the material temperature is 115 , add activated carbon 8 kg, 25 minutes to maintain stirring after the start of pressure filtration; made the filtrate is high-quality products of dioctyl sebacate, and the product of 2460 kg , And the yield was 97.23%.(Pt-C0): 20; density 0.915 g / cm3; flash point (open cup method): 216 ° C; purity: 99.63%.
References:
Anhui xiangfeng new materials co ltd;fan, Xue Song CN105399625, 2016, A Location in patent:Paragraph 0020-0025