What is triisopropylsilane?

Triisopropylsilane(CAS No.: 6485-79-6) is a raw material for synthesizing sterically hindered organosilicon protective agents, mainly used to protect various types of hydroxyl groups, especially in multifunctional hydroxyl compounds, and can be selectively protected and deprotected, which is very important for the synthesis of nucleosides, nucleotides and sugar compounds; it is also a raw material for synthesizing antifouling coating compositions that have coatings that are difficult to have defects such as capillary cracks even after long-term immersion in seawater, can prevent or inhibit the adhesion of mucus, have excellent water resistance, and can effectively produce antifouling effects for a long time. The composition reduces the content of volatile organic compounds (VOC) evaporated into the air and has a high degree of environmental safety.

Chemical properties of triisopropylsilane

Chemical Name: Triisopropylsilane

CAS No.: 6485-79-6

MF: C9H22Si

Mw: 158.36

Boiling point: 84-86 °C/35 mmHg (lit.)

Density: 0.773 g/mL at 25 °C (lit.)

Structure:

The Application of Triisopropylsilane

The plasma enhanced atomic layer deposition (PEALD) process is a technique for the growth of SiO2 thin films using a plasma activated triisopropylsilane [TIPS, ((iPr)3SiH)] precursor. TIPS is activated by an argon plasma during the precursor injection phase of the process. With activated TIPS, the growth rate of the deposited film per cycle can be controlled by adjusting the plasma ignition time. The PEALD technique allows the deposition of SiO2 films free of carbon impurities at temperatures as low as 50°C. In addition, the films obtained with plasma ignition times of 3 and 10 seconds have similar RMS surface roughness values. The vapor pressure of TIPS was measured to evaluate the suitability of TIPS as a precursor for low temperature deposition of SiO2 films. The thermal stability and reactivity of gas phase triisopropylsilane to water vapor were investigated by analyzing the intensity changes of the C-H and Si-H peaks in the Fourier transform infrared spectra of TIPS.

Manufacturer of Triisopropylsilane

Daken Chemical Limited is a mian manufacturer of Triisopropylsilane in China, if you have demands for Triisopropylsilane, please feel free to contact us, we will response within 24 hours.

Company name: Daken Chemical Limited

Add: Unit C 9/F Winning House, 72-76 Wing Lok Street, Sheung Wan, Hong Kong

Tel: +86 0371 6667 0886

Email: ellen.zhao@dakenchem.com

Web: www.dakenchem.com