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Alfa Chemistry 企業(yè)の連絡(luò)先情報

名前:Alfa Chemistry
電話番號:-
電子メール:Info@alfa-chemistry.com
國籍:United States
ウェブサイト:www.alfa-chemistry.com/
商品の合計數(shù):24072
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製品カタログ

Niobium Silicide NbSi2 Powder二けい化ニオブ (平均粒徑 2? 5ΜM)12034-80-9NbSi2
Molybdenum Disulfide (MoS2) Sputtering Targetsniobium(IV) telluride12034-83-2NbTe2
Copper Selenide (CuSe) Sputtering Targetsスチビントリイルニッケル(III)12035-52-8NiSb
Lead (Pb) Sputtering Targetsルテニウム(IV)ジオキシド12036-10-1O2Ru
Bismuth Ferrite Garnet (Bi3Fe5O12) Sputtering Targets12039-76-8SiV3
Nickel Boron (Ni-B) Alloy Sputtering Targets二けい化タンタル12039-79-1Si2Ta
Beryllium (Be) Sputtering Targets12039-87-1Si2V
Silicon Sulfide (SiS2) Sputtering Targets二けい化ジルコニウム12039-90-6Si2Zr
Yttrium Manganese Oxide (YMnO3) Sputtering Targets12043-29-7Al2Te3
Barium Zirconate (BaZrO3) Sputtering Targets12045-27-1BV
Tantalum (Ta) Sputtering Targetsジニトリロクロム(VI)12053-27-9CrN
Europium (Eu) Sputtering Targetsmolybdenum(II) oxide12058-07-0MoO
Aluminum Chromium (Al-Cr) Alloy Sputtering Targetsmolybdenum(IV) telluride12058-20-7MoTe2
Molybdenum Oxide (MoO3) Sputtering Targetsけい化ニオブ12060-34-3Nb5Si3
Cobalt Nickel Chromium (Co-Ni-Cr) Alloy Sputtering Targets四窒化三ゲルマニウム12065-36-0Ge3N4
Nickel Chromium (Ni-Cr) Alloy Sputtering Targets12067-56-0Si3Ta5
Cadmium Telluride (CdTe) Sputtering Targetsけい化チタン12067-57-1Si3Ti5
Tungsten (W) Evaporation Material12067-66-2TaTe2
Cadmium (Cd) Sputtering Targets炭化タングステン12070-13-2CW2
Lithium Fluoride (LiF) Sputtering Targets12125-23-4MnS2
Molybdenum Silicide MoSi2 Powder二ケイ化モリブデン12136-78-6MoSi2
Nickel boride (Ni2B) Sputtering Targetsタンタル(IV)ジスルフィド12143-72-5S2Ta
Chromium Cobalt (Cr-Co) Alloy Sputtering Targets12158-89-3CuH4SSnZn
Neodymium Copper Oxide (NCO) Sputtering Targets二ケイ化ニッケル(NiSi2)12201-89-7NiSi2
Cadmium Sulfide (CdS) Sputtering Targetsジボラントリイルタングステン(VI)12228-69-2B2W
Tin Fluoride (SnF2) Sputtering Targets12230-80-7BaH4MnO
Hafnium Silicide HfSi2 Powderケイ化ハフニウム12401-56-8HfSi2
Zinc Copper (Zn-Cu) Alloy Sputtering Targetsセレン化アルミニウム1302-82-5Al2Se3
Niobium Sulfide (NbS2) Sputtering Targetsふっ化アルミニウムナトリウム1302-84-7AlFH5Na
Strontium Iron Oxide (SFO) Sputtering Targets三硫化二砒素1303-33-9As2S3
Strontium Manganese Oxide (SrMnO3) Sputtering Targets三セレン化二ひ素1303-36-2As2Se3
Nickel Chromium Aluminum (Ni-Cr-Al) Alloy Sputtering Targetsセレン化タンタル12039-55-3Se2Ta
Tin(ii)tellurideすず(II)テルリド12040-02-7SnTe
Barium Iron Oxide Nanoparticles / Nanopowderバリウム鉄オキシド12047-11-9BaFeH4O
Cobalt Iron Oxide Nanoparticles / Nanopowder酸化コバルト鉄12052-28-7CoFe2O4
Gadolinium Oxide Nanoparticle Dispersion酸化ガドリニウム,3N512064-62-9Gd2O3
Cobalt Oxide (Co3O4) Sputtering Targetsセレン化ゲルマニウム()12065-11-1GeSe2
TITANIUM OXIDE酸化チタン12065-65-5H2OTi
Calcium Manganate (CaMnO3) Sputtering Targetsセレン化チタン12067-45-7Se2Ti
Neodymium Boride (NdB6) Sputtering Targetsテルル化ニッケル12142-88-0NiTe
Bismuth Ferrite (BiFeO3) Sputtering Targetsタングステン（IV）テルル化物12067-76-4Te2W
Bismuth selenide2,4,5-トリセレナ-1,3-ジビスマビシクロ[1.1.1]ペンタン12068-69-8Bi2Se3
Molybdenum Monoxide (MoO) Sputtering Targets硫化ニオブ（IV）12136-97-9NbS2
Titanium Cobalt (Ti-Co) Alloy Sputtering Targetsコバルト(II)1308-06-1Co3O4-2
Samarium Scandium Oxide (SSO) Sputtering Targets硫化スズ(硫化錫)1314-95-0SSn
Yttrium Barium Copper Oxide (YBCO) Sputtering Targets五硫化アンチモン1315-04-4H2SSb
Iron Carbon (Fe-C) Alloy Sputtering Targets硫化鉄()1317-37-9FeS
Chromium Nickel (Cr-Ni) Alloy Sputtering Targets銅(II)セレニド1317-41-5CuSe
Antimony Telluride Sb2Te3 Powder1,3-ジスチバ-2,4,5-トリテルラビシクロ[1.1.1]ペンタン1327-50-0Sb2Te3
Bismuth Sulfide Bi2S3 Powder硫化ビスマス()1345-07-9Bi2S3
Iron Oxide (Fe2O3) Sputtering Targetsけい素ジスルフィド13759-10-9S2Si
Lithium Iron Phosphate (LiFePO4) Sputtering Targetsマンガン(II)スルフィド18820-29-6MnS
Cobalt Oxide (Co2O3) Sputtering Targets2025-34-2
Chromium Nitride (Cr2N) Sputtering Targets硫化銅(Ⅰ)22205-45-4Cu2S
Neodymium Oxide Rotatable Sputtering Target酸化ネオジム,3N51313-97-9Nd2O3
Tantalum(V) oxide酸化タンタル1314-61-0O5Ta2
Titanium(III) fluorideトリフルオロチタン(III)13470-08-1F3Ti
Neodymium Fluoride Sputtering Targetトリフルオロネオジム(III)13709-42-7F3Nd
Praseodymium Fluorideトリフルオロプラセオジム(III)13709-46-1F3Pr
Hafnium fluoride四フッ化ハフニウム13709-52-9F4Hf
Erbium(III) fluorideトリフルオロエルビウム13760-83-3ErF3
Samarium Fluoride Sputtering Targetトリフルオロサマリウム(III)13765-24-7F3Sm
Indium(III) nitrideニトリロインジウム(III)25617-98-5InN
Zirconium nitrideジルコニウムニトライド25658-42-8NZr
Hafnium Nitride HfN Powder窒化ハフニウム25817-87-2HfN
Gadolinium(III) Nitride GdN臭化ガドリニウム25764-15-2GdN
Titanium Trioxide (Ti2O3)12185-56-7CdH4OSn
Potassium Selenide Nanoparticlesセレノビスカリウム1312-74-9K2Se
Rubidium Selenide Powder31052-43-4Rb2Se
Cesium Selenide Powderセレン化セシウム31052-46-7Cs2Se
Manganese Iron Oxide12063-10-4Fe2MnO4
Antimony Tin Oxide ATO Powder128221-48-7H4OSbSn
Palladium Oxide Nanopowderパラジウム(II)オキシド1314-08-5OPd
Barium Aluminum Nanopowderバリウム アルミニウム オキシド12004-04-5AlBaH7O
Iridium oxide(IV) Nano Powderイリジウム(IV)ジオキシド12030-49-8IrO2
Samarium Ferrate (SmFeO3) Sputtering Targetsアンチモン化28980-49-6HSbSn
Iron Gallium (Fe-Ga) Alloy Sputtering Targetsニトリロ鉄(III)37245-77-5Fe6N2
Tungsten Boride (WB) Sputtering Targets一酸化クロムけい素37264-20-3CrOSi
Samarium Cobalt (Sm-Co) Alloy Sputtering Targets39332-13-3As4Sn3
Gallium Sulfide Ga2S3 Powder硫化ガリウム12024-22-5Ga2S3
Flamtard hスズ酸亜鉛012036-37-2H4OSnZn
Yttrium (Y)アンチモン化カドミウム(CdSb)12050-27-0CdSb
Niobium Carbide (NbC) Sputtering Targetsフッ化ストロンチウム7783-48-4F2Sr
Polyester Resin26123-45-5C16H16O9
Polyetheretherketone29658-26-2C19H14F2O3
Polyaryletherketone55088-54-5C33H22Cl2O5
Lutetium Metalルテチウム7439-94-3Lu
Terbium Metalテルビウム,削り狀7440-27-9Tb
Erbium Metalエルビウム7440-52-0Er
Cadmium arsenide砒化カドミウム12006-15-4As2Cd3
Nylon 12ナイロン－１２24937-16-4(C12H23NO)n
Platinum Wire白金7740-06-4Pt
Manganese Titanium Oxide Nanopowderチタン酸マンガン/ 99+%12032-74-5H2MnOTi
Zinc Stannate Nanoparticles12036-37-1O3SnZn
Strontium Telluride Nanopowder12040-08-3HSrTe
Zinc Iron Oxide Nanoparticles / Nanopowder黃色酸化鉄12063-19-3Fe2O4Zn
Aluminum Silicate Nanoparticlesケイ酸アルミニウム12141-46-7Al2O5Si
Cadmium Sulfide Selenide Nanoparticles硫セレン化カドミウム12214-12-9Cd2SSe
Nylon 11ナイロン-1125035-04-5C33H63N3O3X2
Aluminium Chromium Alloy Sputtering Target37258-56-3AlCr
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