Polmet
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氧化鋁型拋光粉Polmet
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LGC-300
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實驗室玻璃清洗劑LGC-300
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Buffer HF Improved
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加HF改進的緩沖劑
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53744-42-6
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Al ETCH TYPE A D
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鋁蝕刻劑A 鋁蝕刻劑D
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Palladium ETCH TFP
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鈀蝕刻劑和鉑蝕刻劑
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TRANSETCH — N
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氮化硅、氮化鎵或氧化鋁膜的選擇性蝕刻劑TRANSETCH — N
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TRANSENE Ultrasonic Detergent TUD
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Transene 超聲洗滌劑TUD
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Silver etchant TFS
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銀蝕刻劑TFS
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TANTALUM NITRIDE ETCHANT SIE8607
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鉭蝕刻劑SIE—8607和111
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BUFFERED OXIDE ETCHANTS (BOE)
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BUFFERED OXIDE ETCHANTS (BOE)10:1 15:1 100:1
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CHROMIUM ETCHANT
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鉻蝕刻劑1020,1020AC
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TITANIUM ETCHANTS
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鈦蝕刻劑TFT,TFTN
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Silox Vapox III
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二氧化硅(SiO2)蝕刻劑Silox Vapox III
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NICKEL ETCHANT
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鎳蝕刻劑TFB,TFG,I型
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TRANSENE-100
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Transene 100 清洗劑
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GOLD ETCHANT
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金蝕刻劑8148,TFA,8110,8111
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ITO etchant TE-100
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氧化錫/銦錫蝕刻劑TE100
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MOLY ETCHANT TFM
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TFM鉬蝕刻和TFW鎢蝕刻劑
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COPPER ETCHANTS
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銅蝕刻劑CE-100,CE-200,APS-100,49-1,BTP
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NICHROME ETCHANTS
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鎳鉻蝕刻劑TFC和TFN
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TI-TUNGSTEN ETCHANT TiW-30
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鈦—鎢蝕刻劑TiW—30
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Etchants
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半導體蝕刻劑
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Gallium Phophide ETCH
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磷化鎵蝕刻劑GaP
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