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Postion:Product Catalog >Organic Chemistry>Organic fluorine compound>Parylene AF4
Parylene AF4
  • Parylene AF4

Parylene AF4 NEW

Price Get Latest Price
Package 100g 200g 500g
Min. Order: 100g
Supply Ability: 100kg
Update Time: 2024-11-13

Product Details

Product Name: Parylene AF4 CAS No.: 3345-29-7
Min. Order: 100g Purity: 99.7%
Supply Ability: 100kg Release date: 2024/11/13

Parylene AF-4 is the only parylene type that displays a consistent degree of UV-resistance, one wherein performance is maintained relatively long-term. Like the other parylene types, AF-4 also forms an effective, structurally continuous protective film as thin as several hundred angstroms, due to uniqueness of the chemical vapor deposition (CVD) process used to coat substrate surfaces.

Also called aliphatic fluorinate, AF-4 replaces the alpha hydrogen atom of the N dimer with fluorine, and totals 4 atoms. This compositional variation allows AF-4 to generate the lowest parylene coefficient of friction and dielectric constant throughout UV-exposure, and the highest penetrating ability. AF-4 is also useful in high temperature, short-term applications up to 450°C.

Basic information

Product Name:2,2,3,3,8,8,9,9-Octafluorotricyclo[8.2.2.24,7]hexadeca-4,6,10,12,13,15-hexaene
Synonyms:1,1,2,2,9,9,10,10-Octafluoro[2.2]paracyclophane;Tricyclo[8.2.2.24,7]hexadeca-4,6,10,12,13,15-hexaene, 2,2,3,3,8,8,9,9-octafluoro-;2,2,3,3,8,8,9,9-Octa;PARYLENE AF4;Tricyclo[8.2.2.24,7]hexadeca-4,6,10,12,13,15-hexaene, 2,2,3,3,8,8,9,9-octafluoro Tricyclo[8.2.2.24,7]hexadeca-4,6,10,12,13,15-hexaene, octafluoro;parylene AF4;2,2,3,3,8,8,9,9-Octafluorotricyclo[8.2.2.24,7]hexadeca-4,6,10,12,13,15-hexaene;Parylene AF4
CAS:3345-29-7
MF:C16H8F8
MW:352.22

 

 

Chemical Properties

Melting point240-250°C
Boiling point259.3±40.0 °C(Predicted)
density1.47±0.1 g/cm3(Predicted)
formpowder

 

Features

Characteristics of Parylen AF4 coating:

Specialties:

? Unmatched UV stability
? Excellent thermal stability at high service temperature (350)
? Unmatched oxidation stability
? Completely conformal coating
? Superior crevice penetration, pin hole free
? Anti-saline damage
? Anti-stick ion

 

Barrier properties:

? Chemical insolubility and solvent resistant
? Low water absorption
? Hydrophobic properties
? Low gas permeability , no out-gassing

 

Physical & mechanical properties:

? Transparent
? Light-weight and ultra-thin
? Low CTE
? Low coefficient of friction
? Good dry lubricity
? Abrasion resistance
? Stabilization of components and structures
? Particulate immobilization

 

Electrical properties:

? Electrical insulation
? High dielectric strength
? High volume resistivity ,ohm-cm
? Low dissipation factor
? Low dielectric constant
? Mitigation of tin whisker growth




Company Profile Introduction

Shenzhen FCD Technology Co., Ltd. is a high-tech company specializing in the development of nano "three-proof" coatings. Our business encompasses research and development, production, and sales of Parylene raw materials, Parylene equipment, and Parylene coating processes. Our products feature top-tier "three-proof" performance (IP68), FDA-certified biocompatibility, unmatched surface dry lubrication, ultra-thin high-pressure insulation, and wide temperature resistance (-200°C to +450°C). These outstanding properties enable Parylene to be widely applied in the aerospace & defense, medical devices, new energy vehicles, consumer electronics, and other industries. With the global industrial upgrade and iteration, our products are increasingly recognized and utilized across various industries due to their excellent performance. Our company's core team consists of Ph.D. holders, Masters graduates, and researchers from top universities. For many years, they have been dedicated to researching Parylene materials and their applications in coatings, achieving numerous technical advancements and developing products that meet international advanced standards. Additionally, the team has established cooperative relationships with several domestic universities and research institutes affiliated with the Chinese Academy of Sciences.

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