| Identification | Back Directory | [Name]
TRIS(DIMETHYLAMINO)SILANE | [CAS]
15112-89-7 | [Synonyms]
TDMAS
3DMAS
LS 1460
amino)siL
(Me2N)3SiH
3DMAS : [(CH3)2N]3SiH
Tri(dimethylamino)silane
Tris(dimethyamino)silane
Tris(dimethylamido)silane
TRIS(DIMETHYLAMINO)SILANE
TRIS(DIMETHYLAMINO)SILANE 99+%
Tris(dimethylamino)silane Liquid
Tris(dimethylamino)silane 3DMAS
TRIS(DIMETHYLAMINO)SILANE, 99.9+%
Tris(dimethylamino)silane, 99+% 3DMAS
N,N',N''-Silanetriyltris(dimethylamine)
N,N',N''-(Silanetriyl)tris(dimethylamine)
n,n,n’,n’,n’’,n’’-hexamethyl-silanetriamin
n,n,n’,n’,n’’,n’’-hexamethylsilanetriamine
N,N,N’,N’,N’’,N’’-hexamethyl-Silanetriamine
TRIS(DIMETHYLAMINO)SILANE ISO 9001：2015 REACH
Silanetriamine, N,N,N',N',N'',N''-hexamethyl-
Tris(dimethylamino)silane electronic grade, 99.999%
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM
Tris(dimethylamino)silane packaged for use in deposition systems
Tris(diMethylaMino)silane, 99+%, 14-8750, contained in 50 Ml Swagelok cylinder (96-1070) for CVD/ALD
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok cylinder (96-1070) for CVD/ALD
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD
N,N,N',N',N'',N''-hexamethyl-Silanetriamine tris(Dimethylamino)silane n,n,n',n',n'',n''-hexamethylsilanetriamine n,n,n',n',n'',n''-hexamethyl-silanetriamin Silanetriamine,N,N,N',N',N'',N''-hexamethyl- | [EINECS(EC#)]
239-165-0 | [Molecular Formula]
C6H19N3Si | [MDL Number]
MFCD00048006 | [MOL File]
15112-89-7.mol | [Molecular Weight]
161.32 |
| Chemical Properties | Back Directory | [Melting point ]
<0°C | [Boiling point ]
145 °C | [density ]
0,838 g/cm3 | [refractive index ]
1.4247 | [Fp ]
25°C | [form ]
liquid | [pka]
10.93±0.70(Predicted) | [color ]
colorless to light yellow | [Specific Gravity]
0.84 | [Hydrolytic Sensitivity]
8: reacts rapidly with moisture, water, protic solvents | [Sensitive ]
air sensitive, moisture sensitive | [EPA Substance Registry System]
|
| Hazard Information | Back Directory | [Uses]
Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor. | [General Description]
Please inquire for quantity, pricing, and packaging options. |
|
|